Systems & plasma applications

APEMCO is providing with three types of systems with different applications purposes.

APEMCO PlasmaZone®

machine plasmaZone
plasmaZone

Power10 to 1000 W
Voltage1 to 100 kV
Frequency1 to 100 kHz
Plasma gasnitrogen, air, oxygen, carbon dioxide, hydrogen, helium, argon, ... and any mixtures thereof
Gas consumption5 to 50 l/min
Chemical precursors (liquid or gaseous)optional: hydrocarbons, organic acids, siloxanes
Precursor consumption1 to 20 ml/min
Homogeneous plasma areavariable, typical 8 to 20 cm
Inter electrode distance0.5 to 25 mm
Working temperature25 to 250 °C
Typical deposition rate for coatings1 to 100 nm/sec

APEMCO PlasmaSpot®

Power20 to 500 W
Voltage5 to 25 kV
Frequency1 to 100 kHz
Plasma gasnitrogen, air, oxygen, carbon dioxide, hydrogen, helium, argon, ... and any mixtures thereof
Gas consumption5-100 l/min (typically 40-80l/min.)
Chemical precursors (liquid or gaseous)optional: hydrocarbons, organic acids, siloxanes
Precursor consumption1 to 20 ml/min
Homogeneous plasma areaDiameter of 10 to 25 mm
Working distance1 to 25 mm
Working temperature25 to 250 °C
Typical deposition rate for coatings10 to 100 nm / s x cm2

APEMCO PlasmaLine®

PlasmaLine1200v2

Power10 to 50 W / cm
Voltage1 to 25 kV
Frequency40 to 100 kHz
Plasma gasnitrogen, air, oxygen, carbon dioxide, hydrogen, helium, argon, ... and any mixtures thereof
Gas consumption5 to 7,5 l / min / cm
Chemical precursorsoptional: hydrocarbons, organic acids, siloxanes
Precursor consumption1 to 100 ml / min
Homogeneous plasma areaUp to 1200 cm
Inter electrode distance0,5 to 10 mm
Working temperature25 to 250 °C
Typical deposition rate for coatings1 - 100 nm / sec